O MACHO SECRETO

This dissertation, "Efficient Finite-difference Schemes in Thermal Analysis and Inverse Lithography for Integrated Circuit Manufacturing" by Yijiang, Shen, 沈逸江, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b4545504 Subjects: Finite differences Integrated circuits - Testing Integrated circuits - Thermal properties Integrated circuits - Design and construction - Mathematics